SOLUTION NMR


NMR Experiment
Experiment Type Sample Contents Ionic Strength Solvent pH Pressure Temprature (K)
1 3D_15N-separated_NOESY 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
2 2D NOESY 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
3 2D TOCSY 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
4 3D_13C-separated_NOESY 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
5 12C/13C-filtered-NOESY-HSQC 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
6 HNCA 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
7 NHCACB 1MM MUTT, 1.3MM 8-OXO-DGMP, 15MM MGCL2, 4MM D11-TRIS-HCL, PH 7.5, 21MM NACL, 0.34MM NAN3. 21 mM NaCl 90% H2O/10% D2O 7.5 ambient 295
NMR Spectrometer Information
Spectrometer Manufacturer Model Field Strength
1 Varian UNITYPLUS 600
NMR Refinement
Method Details Software
simulated annealing torsion angle dynamics the structures are based on 1746 NOE-derived distance constraints, 186 dihedral angle restraints derived from TALOS, 82 distance restraints from hydrogen bonds and 3 assumed distances ligand/protein (see Case 4, Table 1 in reference). 1
NMR Ensemble Information
Conformer Selection Criteria structures with the least restraint violations
Conformers Calculated Total Number 50
Conformers Submitted Total Number 20
Representative Model 1 (lowest energy)
Computation: NMR Software
# Classification Version Software Name Author
1 processing 2.1 NMRPipe F. Delaglio
2 structure solution 1.1 CNS A. Brunger et al.
3 data analysis 1999.019.15.47 TALOS Cornilecu, Delaglio and Bax
4 refinement 1.1 CNS A. Brunger et al.
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